Niedernhall, Germany

Marius Lehmann

This inventor holds 1 USPTO granted patent. Top assignee: Ebm-Papst Mulfingen Gmbh & Co Kg. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marius Lehmann. Retrieved from https://idiyas.com/inventor/marius-lehmann-knx5rfpb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Marius Lehmann: Innovator in Fan Technology

Introduction

Marius Lehmann is a notable inventor based in Niedernhall, Germany. He has made significant contributions to the field of fan technology, particularly with his innovative designs that enhance performance and efficiency. His work is recognized for its practical applications in various industries.

Latest Patents

Marius Lehmann holds a patent for a fan and fan blades. The patent describes a fan blade that features a front inflow edge and a rear outflow edge. Notably, the fan blade also incorporates an at least partially wavy inflow edge, which forms a wave with a specific three-dimensional waveform. This design aims to improve airflow and overall fan efficiency.

Career Highlights

Lehmann is currently employed at Ebm-Papst Mulfingen GmbH & Co. KG, a leading company in the field of fan and motor technology. His role at the company allows him to apply his innovative ideas and collaborate with other experts in the industry.

Collaborations

Throughout his career, Marius has worked alongside talented colleagues, including Marc Schneider and Andreas Lucius. Their collaborative efforts contribute to the advancement of technology in their field.

Conclusion

Marius Lehmann's contributions to fan technology exemplify the impact of innovative thinking in engineering. His patent and work at Ebm-Papst Mulfingen GmbH & Co. KG highlight his commitment to enhancing product performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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