Delft, Netherlands

Marit Rosa Smeets

This inventor holds 1 USPTO granted patent. Top assignee: Delmic IP B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marit Rosa Smeets. Retrieved from https://idiyas.com/inventor/marit-rosa-smeets

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Marit Rosa Smeets: Micromachining with Focused Ion Beams.

Introduction

Marit Rosa Smeets is an inventor associated with Delft, the Netherlands, and Delmic IP B.V. Her patent work addresses micromachining samples with a focused ion beam while monitoring them optically.

Latest Patents

Smeets is credited with 1 patent: “Method and Apparatus for Micromachining a Sample Using a Focused Ion Beam.” The invention combines a sample holder, a focused ion beam exposure system, and a light optical microscope. The microscope can image or monitor a sample during or after ion-beam exposure.

The method analyzes reflected or transmitted light and measures intensity modulation caused by optical interference between light from two sample surfaces. That measurement can be used to determine the distance between the surfaces, supporting observation and control during micromachining.

Career Highlights

Smeets’s listed patent highlights an approach that integrates focused ion beam processing with optical monitoring. This combination is designed to provide information about a sample’s surfaces while it is being processed.

Collaborations

Her listed coworkers include Daan Benjamin Boltje and Mart Guus Ferdinand Last. The patent information also associates her work with Delmic IP B.V.

Conclusion

Marit Rosa Smeets’s patent describes an integrated method for micromachining and optical measurement, bringing focused ion beam exposure and sample monitoring together in one system.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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