Mario Rannello

Title: The Innovative Mind of Mario Rannello

Introduction

Mario Rannello is a distinguished inventor based in Pisa, Italy. He has made significant contributions to the field of optical metrology, particularly through his innovative patent. His work reflects a deep understanding of optical systems and their applications in determining positional data.

Latest Patents

Rannello holds a patent for an "Optical unit for a projective optical metrological system for determining quantities relative to the asset and/or position and communicating data." This optical unit is designed to receive light signals from a constellation of light sources. It features an optoelectronic image acquisition system along with two optical circuits that process the light signals. The system is capable of forming two distinct images, which are crucial for determining the position and attitude of the light constellation. Additionally, the optical unit includes an electronic processing unit that analyzes these images to extract relevant positional information.

Career Highlights

Throughout his career, Mario Rannello has worked with notable companies such as Thales Alenia Space Italia S.p.a. and Scuola Superiore Di Studi Universitari E Perfezionamento Sant' Anna. His experience in these organizations has allowed him to refine his skills and contribute to advanced optical technologies.

Collaborations

Rannello has collaborated with esteemed colleagues, including Fulvio Bresciani and Valter Basso. These partnerships have fostered a creative environment that has led to innovative solutions in optical systems.

Conclusion

Mario Rannello's contributions to optical metrology through his patent and collaborative efforts highlight his role as a key innovator in the field. His work continues to influence advancements in optical technologies and metrological systems.