Waalwijk, Netherlands

Mario Cornelis Schoondermark

This inventor holds 1 USPTO granted patent and 3 published patent applications and 1 EPO patent. Top assignee: Dsm IP Assets B.v.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mario Cornelis Schoondermark. Retrieved from https://idiyas.com/inventor/mario-cornelis-schoondermark

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Innovations by Mario Cornelis Schoondermark

Introduction

Mario Cornelis Schoondermark is a notable inventor based in Waalwijk, Netherlands. He has made significant contributions to the field of coatings, particularly with his innovative approaches to radiation curable aqueous compositions.

Latest Patents

Schoondermark holds a patent for a "Radiation curable aqueous composition for low gloss coatings." This composition features a gloss of ≤60 upon drying and includes a combination of polyurethane, radiation curable components, and an associative thickener. The formulation ensures that at least 80 wt % of the components have a particle size greater than 500 nm, with a C=C bond concentration ranging from 0.2 to 5.0 mmol per g of the combined components.

Career Highlights

He is currently associated with DSM IP Assets B.V., where he continues to develop innovative solutions in the coatings industry. His work focuses on enhancing the performance and sustainability of coating materials.

Collaborations

Schoondermark collaborates with talented professionals such as Ilse Van Casteren and Roland Tennebroek, contributing to a dynamic and innovative work environment.

Conclusion

Mario Cornelis Schoondermark's contributions to the field of coatings through his patented innovations highlight his expertise and commitment to advancing technology in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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