Company Filing History:
Years Active: 2020-2022
Title: Marina Vroubel: Innovator in Semiconductor Technology
Introduction
Marina Vroubel is a prominent inventor based in Nijmegen, Netherlands. She has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase her innovative spirit and technical expertise.
Latest Patents
One of her latest patents is titled "Fringe capacitor arranged based on metal layers with a selected orientation of a preferred direction." This invention involves a fringe capacitor that comprises a plurality of unidirectional metal layers, all oriented in the same direction. The first fingers of the capacitor are formed in a first layer, interdigitated and parallel to the preferred direction. The second fingers are formed in a second layer, also interdigitated and parallel to the same orientation, with the two layers separated by a non-oriented layer.
Another notable patent is for a "Semiconductor device comprising a PN junction diode." This device includes a semiconductor substrate with a first conductivity type and a buried oxide layer. A semiconductor region with a second conductivity type extends beneath the buried oxide layer, forming a pn junction with the first conductivity type. The pn junction is strategically located beneath the buried oxide layer, enhancing the device's functionality.
Career Highlights
Marina Vroubel is currently employed at NXP B.V., where she continues to push the boundaries of semiconductor technology. Her work has been instrumental in developing innovative solutions that address modern technological challenges.
Collaborations
Throughout her career, Marina has collaborated with talented individuals such as Viet Thanh Dinh and Paul Grudowski. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Marina Vroubel is a remarkable inventor whose contributions to semiconductor technology are noteworthy. Her patents reflect her dedication to innovation and her ability to solve complex engineering problems. Her work continues to inspire future advancements in the field.