This inventor holds 1 USPTO granted patent. Top assignee: Clariant Finance (Bvi) Limited. Active years: 1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998
Title: Marina V Plat: Innovator in Photoresist Development
Introduction
Marina V Plat is a notable inventor based in Hyde Park, NY (US). She has made significant contributions to the field of photoresist technology, particularly through her innovative methods and compositions.
Latest Patents
Marina holds 1 patent for her invention titled "Method of developing positive photoresist and compositions therefor." This patent illustrates a method and composition for developing positive photoresists. The developer includes an ammonium hydroxide aqueous base and a surfactant of the fluorinated alkyl alkoxylate class, which is most preferably present in an amount of from 10 to 30 ppm. A particularly preferred surfactant includes sulfonyl and amine moieties.
Career Highlights
Marina is currently employed at Clariant Finance (BVI) Limited, where she continues to advance her research and development efforts in the field of photoresists. Her work has been instrumental in enhancing the efficiency and effectiveness of photoresist applications.
Collaborations
Some of her notable coworkers include Stanley A Ficner and John Magvas, who have collaborated with her on various projects within the company.
Conclusion
Marina V Plat's contributions to the field of photoresist development highlight her innovative spirit and dedication to advancing technology. Her work continues to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile