Marina Mariano Juste

Title: Marina Mariano Juste: Innovator in Lithography Technology

Introduction

Marina Mariano Juste is a prominent inventor based in Leuven, Belgium. She has made significant contributions to the field of lithography, particularly in the development of advanced scanning technologies. With a total of 2 patents, her work has garnered attention in both academic and industrial circles.

Latest Patents

Marina's latest patents include a lithography scanner that features a light source emitting extreme ultra-violet (EUV) light. This innovative scanner incorporates a pellicle with an EUV transmissive membrane designed to scatter the EUV light into an elliptical pattern. Additionally, her patent on induced stress for EUV pellicle tensioning outlines a method for protecting a photomask using a film of carbon nanotubes, showcasing her expertise in advanced materials and their applications in photolithography.

Career Highlights

Throughout her career, Marina has worked with notable organizations such as Imec Vzw and Katholieke Universiteit Leuven, also known as KU Leuven R&D. Her experience in these institutions has allowed her to collaborate on cutting-edge research and development projects, further enhancing her skills and knowledge in the field.

Collaborations

Marina has collaborated with esteemed colleagues, including Marina Yurievna Timmermans and Ivan Pollentier. These partnerships have contributed to her innovative work and have fostered a collaborative environment for research and development.

Conclusion

Marina Mariano Juste is a distinguished inventor whose contributions to lithography technology are noteworthy. Her patents reflect her commitment to advancing the field and her ability to innovate in complex areas of research.