Company Filing History:
Years Active: 2002-2004
Title: The Innovative Mind of Marilyn Kamna: A Spotlight on her Contributions to Photomask Technologies
Introduction
Marilyn Kamna, based in San Jose, CA, is a notable inventor with a solid track record in the realm of photomask technologies. With two patents to her name, Kamna has made significant strides in enhancing processes within the semiconductor manufacturing industry. Her expertise and contributions reflect the innovative spirit that drives advancements in technology today.
Latest Patents
Kamna's most recent patents focus on a groundbreaking approach to photomask frame modification aimed at eliminating process-induced critical dimension control variations. Her invention involves an apparatus that includes a mask featuring an active device area and a moat that substantially surrounds this area. The moat is engineered to have a width greater than the plasma specie diffusional length, enhancing the precision of semiconductor manufacturing. The method she developed comprises depositing a resist layer on a mask substrate containing both transparent and opaque layers, followed by exposure to radiation. This radiation is meticulously patterned to produce features within the active device area and create the moat that significantly improves manufacturing outcomes.
Career Highlights
Kamna has built her career at Intel Corporation, where she has utilized her expertise to advance photomask technologies significantly. Her innovative approach to problem-solving and ability to drive technology forward have made her a valuable asset to her team and the semiconductor industry as a whole.
Collaborations
Throughout her career, Kamna has collaborated with a number of talented engineers and innovators, including her coworkers Wilman Tsai and Frederick Chen. These collaborations have fostered an environment of creativity and shared expertise, contributing to the development of powerful innovations that push the boundaries of the technology sector.
Conclusion
Marilyn Kamna stands as a prominent figure in the field of semiconductor manufacturing through her pioneering inventions. Her work on photomask technologies exemplifies how innovative thinking and collaboration can lead to advancements that impact the entire industry. As she continues to explore new frontiers in technology, Kamna remains an inspirational inventor whose contributions will undoubtedly influence future innovations.