Company Filing History:
Years Active: 1999
Title: The Innovative Contributions of Marilyn Hwan
Introduction
Marilyn Hwan is a notable inventor based in San Carlos, CA (US). She has made significant contributions to the field of semiconductor technology. Her innovative approach has led to the development of a unique method that enhances the accuracy of alignment marks on semiconductor workpieces.
Latest Patents
Marilyn Hwan holds 1 patent for her invention titled "Alignment mark contrast enhancement." This patent describes a method of providing etched alignment marks on a semiconductor workpiece that has a substantially planar surface. The method supports accurate alignment of the workpiece in subsequent process operations. The workpiece includes two layers of materials that abut at the surface, such as an insulative layer of silicon dioxide and a conductive layer of tungsten. The process involves etching the surface to reduce the height of one material below the other, creating a small bump that serves as an alignment mark for future operations.
Career Highlights
Marilyn Hwan has worked at LSI Logic Corporation, where she has applied her expertise in semiconductor technology. Her innovative methods have contributed to advancements in the industry, particularly in enhancing the precision of semiconductor manufacturing processes.
Collaborations
Marilyn has collaborated with notable colleagues, including Nicholas F Pasch and Richard S Osugi. These collaborations have further enriched her work and contributed to the development of innovative solutions in semiconductor technology.
Conclusion
Marilyn Hwan's contributions to semiconductor technology through her innovative patent demonstrate her significant role as an inventor. Her work continues to influence the industry and enhance the accuracy of semiconductor manufacturing processes.