Company Filing History:
Years Active: 2002-2003
Title: Mariko Urushibara: Innovator in Semiconductor Polishing Technology
Introduction
Mariko Urushibara is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of semiconductor device polishing, holding a total of 3 patents. Her innovative methods have enhanced the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Mariko's latest patents focus on a method for polishing semiconductor devices. The first patent provides a method that ensures stable high polishing efficiency in the chemical mechanical polishing (CMP) of LSI wafers. It introduces a technique where an electric field is applied to the abrasive grains on a pad. This method attracts the abrasive grains into a diffusion layer in the polishing liquid solvent near the surface of the pad, effectively holding the abrasive grains in the diffusion layer. This innovation not only improves polishing efficiency but also reduces the consumption of polishing liquids and pads.
Career Highlights
Mariko Urushibara is currently employed at Hitachi, Ltd., where she continues to develop advanced technologies in semiconductor manufacturing. Her work has been instrumental in pushing the boundaries of what is possible in the industry.
Collaborations
Throughout her career, Mariko has collaborated with notable colleagues, including Hiroyuki Kojima and Hidemi Sato. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Mariko Urushibara's contributions to semiconductor polishing technology exemplify her dedication to innovation and excellence. Her patents reflect a deep understanding of the complexities involved in semiconductor manufacturing, making her a valuable asset to the industry.