Fukuoka, Japan

Mariko Ohara

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Electric Corporation. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mariko Ohara. Retrieved from https://idiyas.com/inventor/mariko-ohara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Mariko Ohara: Innovator in Semiconductor Technology

Introduction

Mariko Ohara is a prominent inventor based in Fukuoka, Japan. She has made significant contributions to the field of semiconductor technology. Her innovative work has led to the development of a unique semiconductor device that showcases her expertise and creativity.

Latest Patents

Mariko Ohara holds 1 patent for a semiconductor device. This device includes a case that encloses a region filled with a sealing material. The case is constructed from resin, and an electrode is fixed to it. Notably, a section of the electrode features a cutout that allows part of the resin to be exposed to the enclosed region.

Career Highlights

Mariko is currently employed at Mitsubishi Electric Corporation, where she continues to push the boundaries of semiconductor technology. Her work at this esteemed company has positioned her as a key player in the industry.

Collaborations

Throughout her career, Mariko has collaborated with talented individuals such as Masatake Harada and Akira Goto. These partnerships have fostered innovation and contributed to the advancement of their projects.

Conclusion

Mariko Ohara is a trailblazer in the semiconductor field, with her innovative designs and collaborative spirit driving her success. Her contributions are paving the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…