Otsu, Japan

Mariko Matsui


Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Ohtsu, JP (2004)
  • Otsu, JP (2013)

Company Filing History:


Years Active: 2004-2013

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2 patents (USPTO):Explore Patents

Title: Mariko Matsui: Innovator in Clothing Simulation Technology

Introduction

Mariko Matsui is a notable inventor based in Otsu, Japan. She has made significant contributions to the field of clothing simulation technology, holding 2 patents that showcase her innovative approach to garment fitting and design.

Latest Patents

Matsui's latest patents include a clothing simulation apparatus, a clothing simulation program, and a clothing simulation method. The clothing simulation apparatus is designed to precisely determine clothing pressure, ensuring that garments fit snugly against the human body. This apparatus features a fitting part that divides a paper pattern model into multiple elements, applying dynamic characteristics from a fabric model to each element. By utilizing a finite element method, the paper pattern model is deformed to fit virtually onto a human body model. Additionally, the fitting part sets a temporary model to cover a specific section of the human body model, allowing for accurate deformation of the paper pattern model to achieve a proper fit.

Another patent focuses on a base fabric for a hollow-woven air bag. This innovative fabric includes a bag portion formed by connecting several cloth pieces through hollow weaving. It also features a fastened portion A connected to the bag portion and a fastened portion B with a different weave structure, located at the boundary between the bag portion and fastened portion A.

Career Highlights

Mariko Matsui is currently employed at Toyo Boseki Kabushiki Kaisha, where she continues to develop her groundbreaking technologies. Her work has positioned her as a leader in the field of clothing simulation, contributing to advancements that enhance garment design and fitting processes.

Collaborations

Matsui collaborates with talented individuals such as Yumiko Isogai and Kiyoshi Negishi, who contribute to her innovative projects and research endeavors.

Conclusion

Mariko Matsui's contributions to clothing simulation technology reflect her dedication to innovation and excellence in her field. Her patents not only advance the industry but also pave the way for future developments in garment fitting and design.

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