Munich, Germany

Marijke Van Der Meer

This inventor holds 1 USPTO granted patent and 2 published patent applications and 2 EPO patents. Top assignee: 3M Innovative Properties Company. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marijke Van Der Meer. Retrieved from https://idiyas.com/inventor/marijke-van-der-meer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Marijke Van Der Meer: Innovator in Abrasive Technology

Introduction

Marijke Van Der Meer is a notable inventor based in Munich, Germany. She has made significant contributions to the field of abrasive technology, showcasing her innovative spirit and technical expertise.

Latest Patents

Marijke holds a patent for an abrasive article designed for abrading at least one workpiece. This invention features a carrier body and at least one abrasive layer with a main surface and a predefined thickness. The abrasive layer is arranged on the carrier body and includes at least two visual indicators with a cross-section in the main surface. The size, shape, and/or location of these visual indicators depend on the thickness of the abrasive layer at multiple locations.

Career Highlights

Marijke is associated with 3M Innovative Properties Company, where she continues to develop and refine her inventions. Her work has been instrumental in advancing the capabilities of abrasive products in various applications.

Collaborations

Marijke collaborates with Jean-Luc Rifaut, contributing to innovative projects and enhancing the development of new technologies.

Conclusion

Marijke Van Der Meer exemplifies the spirit of innovation in abrasive technology, with her patent reflecting her commitment to improving industrial processes. Her contributions continue to influence the field significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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