Mortsel, Belgium

Marieke Van Remoortere

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Eco3 Bv. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marieke Van Remoortere. Retrieved from https://idiyas.com/inventor/marieke-van-remoortere

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Marieke Van Remoortere: Innovator in Lithographic Printing Technology

Introduction

Marieke Van Remoortere is a notable inventor based in Mortsel, Belgium. She has made significant contributions to the field of lithographic printing technology. With a focus on innovation, she has developed a unique lithographic printing plate precursor that enhances the printing process.

Latest Patents

Marieke holds 1 patent for her invention titled "Lithographic printing plate precursor." This invention includes a substrate with a hydrophilic surface or a hydrophilic layer, coated with a photopolymerisable layer. The coating comprises a polymerisable compound, a photoinitiator, and an adhesion-promoting compound containing at least one thiol group and one group capable of adhering to the substrate.

Career Highlights

Marieke is currently employed at Eco3 Bv, where she continues to push the boundaries of printing technology. Her work has been instrumental in advancing the efficiency and quality of lithographic printing processes.

Collaborations

Throughout her career, Marieke has collaborated with talented individuals such as Fabienne Goethals and Thomas Billiet. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Marieke Van Remoortere is a pioneering inventor whose work in lithographic printing technology has made a lasting impact. Her innovative spirit and dedication to her craft continue to inspire others in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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