Serquigny, France

Marie-Ange Lemaitre

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Arkema France. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marie-Ange Lemaitre. Retrieved from https://idiyas.com/inventor/marie-ange-lemaitre

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Marie-Ange Lemaitre: Innovator in Self-Flame-Retardant Materials

Introduction

Marie-Ange Lemaitre is a notable inventor based in Serquigny, France. She has made significant contributions to the field of materials science, particularly in the development of self-flame-retardant copolyesteramide. Her innovative work has implications for various industries, including electrical and electrotechnical applications.

Latest Patents

Marie-Ange Lemaitre holds a patent for a self-flame-retardant copolyesteramide. This invention is characterized by its production through the polycondensation of at least one polyamide monomer with at least one phosphorus-containing diol. The copolyesteramide is designed for use in the manufacture of electrical and/or electrotechnical objects, tubes, cables, electrical safety objects, molded objects, and items produced through 3D printing.

Career Highlights

Marie-Ange Lemaitre is associated with Arkema France, a leading company in the specialty chemicals and advanced materials sector. Her role at Arkema has allowed her to focus on innovative solutions that enhance safety and performance in various applications.

Collaborations

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Conclusion

Marie-Ange Lemaitre's contributions to the field of self-flame-retardant materials highlight her innovative spirit and dedication to advancing technology. Her work continues to influence the development of safer materials for a variety of applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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