Marianne Mataln

Title: Innovations by Marianne Mataln

Introduction

Marianne Mataln is a notable inventor based in Villach, Austria. She has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. Her work focuses on enhancing the performance and reliability of semiconductor devices.

Latest Patents

One of her latest patents is titled "Stress relieving structure for semiconductor device." This invention includes a semiconductor body with a stress relieving layer that features a patterned surface topography. The design allows for improved stress management within the semiconductor device. Another significant patent is "Semiconductor device with compressive interlayer." This invention involves a structured interlayer that generates compressive residual stress, counteracting the tensile stress from the structured metallization, thereby enhancing device stability.

Career Highlights

Marianne Mataln is currently employed at Infineon Technologies AG, where she continues to innovate in semiconductor technology. Her expertise and inventions have contributed to advancements in the industry, making her a valuable asset to her company.

Collaborations

Throughout her career, Marianne has collaborated with esteemed colleagues such as Michael Nelhiebel and Rainer Pelzer. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Marianne Mataln's contributions to semiconductor technology through her patents and collaborations highlight her role as a leading inventor in her field. Her work continues to influence advancements in semiconductor devices, showcasing her dedication to innovation.