Bellevue, WA, United States of America

Maria Vlachopoulou

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Oracle International Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Maria Vlachopoulou. Retrieved from https://idiyas.com/inventor/maria-vlachopoulou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Maria Vlachopoulou: Inventor in Machine Learning Anomaly Detection.

Introduction

Maria Vlachopoulou is an inventor based in Bellevue, Washington. Her patent work addresses machine-learning methods for improving anomaly detection by adjusting reconstruction losses according to feature importance.

Latest Patents

Vlachopoulou is associated with 1 patent, titled “Anomaly Detection Performance Enhancement Using Gradient-Based Feature Importance.” The invention describes techniques that adjust the reconstruction loss of a model, such as principal component analysis, based on the importance of individual features. During production inference, the system weights each feature’s reconstruction loss by its importance, then evaluates the combined weighted losses to determine whether an input is anomalous. This approach is designed to compensate for concept drift.

Career Highlights

Vlachopoulou is associated with Oracle International Corporation. Her patent reflects work at the intersection of machine learning, feature importance, and anomaly detection.

Collaborations

The patent information names Saeid Allahdadian and Yuting Sun as coworkers associated with Vlachopoulou’s work.

Conclusion

Maria Vlachopoulou’s patent describes a feature-weighted approach to reconstruction-based anomaly detection, with the goal of improving performance as data patterns change.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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