Mississauga, Canada

Maria L Martins

This inventor holds 1 USPTO granted patent. Top assignee: Xerox Corporation. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Maria L Martins. Retrieved from https://idiyas.com/inventor/maria-l-martins

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Maria L Martins - Innovator in Transparent Substrate Technology

Introduction

Maria L Martins is a notable inventor based in Mississauga, Canada. She has made significant contributions to the field of transparent substrate materials, showcasing her innovative spirit and technical expertise.

Latest Patents

Maria holds a patent for "Transparencies," which describes a transparent substrate material designed for receiving or containing an image. This invention comprises a supporting substrate, an anticurl coating layer or coatings underneath, and an ink receiving layer on top. Her work in this area highlights the importance of advanced materials in imaging technologies.

Career Highlights

Maria is currently employed at Xerox Corporation, where she continues to develop and refine her innovative ideas. Her role at such a prestigious company underscores her capabilities as an inventor and her commitment to advancing technology.

Collaborations

Throughout her career, Maria has collaborated with talented individuals such as Shadi L Malhotra and Maya D Stevanovic. These partnerships have likely contributed to her success and the development of her patented technologies.

Conclusion

Maria L Martins is a pioneering inventor whose work in transparent substrate technology has the potential to impact various imaging applications. Her contributions to the field are commendable, and her ongoing work at Xerox Corporation promises further advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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