Company Filing History:
Years Active: 2017-2018
Title: The Innovative Contributions of Mari Shigeta
Introduction
Mari Shigeta is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of etching compositions, particularly in the semiconductor industry. With a total of 2 patents, her work has garnered attention for its innovative approaches to etching materials.
Latest Patents
Mari Shigeta's latest patents include a liquid composition for etching oxides comprising indium, zinc, tin, and oxygen, as well as an etching liquid for oxides containing zinc and tin. The first patent provides a liquid etching composition that effectively etches oxides while maintaining a preferable etching rate. This composition minimizes the generation of deposits and corrosion of wiring materials. The second patent presents an etching liquid that achieves a suitable etching rate for oxides containing zinc and tin, while also preventing precipitate formation and ensuring low corrosiveness to wiring materials.
Career Highlights
Mari Shigeta is currently employed at Mitsubishi Gas Chemical Company, Inc. Her work at this esteemed company has allowed her to develop innovative solutions that address challenges in the etching process. Her expertise in chemical compositions has positioned her as a valuable asset in her field.
Collaborations
Mari collaborates with Kunio Yube, a fellow professional in her field. Together, they work on advancing etching technologies and improving the efficiency of chemical processes.
Conclusion
Mari Shigeta's contributions to the field of etching compositions highlight her innovative spirit and dedication to advancing technology. Her patents reflect her commitment to developing effective solutions in the semiconductor industry.