Tokyo, Japan

Mari Murooka

This inventor holds 1 USPTO granted patent. Top assignee: Tdk Corporation. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mari Murooka. Retrieved from https://idiyas.com/inventor/mari-murooka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Mari Murooka: Inventor of an Ultraviolet-Curing Printing Ink

Introduction

Mari Murooka is an inventor associated with TDK Corporation in Tokyo, Japan. Her patent work addresses printing on slightly adherent plastic surfaces, including polypropylene and polyoxymethylene.

Latest Patents

Murooka is credited with 1 patent: “Printing Ink for Slightly Adherent Plastic Base, Printed Matter of Said.” The invention describes an ultraviolet-curing ink containing an isocyanate compound, added at 0.5 to 35 parts by weight per 100 parts of ink. It also covers printed matter made with the ink and a printing method that uses pretreatment, such as corona discharge, shortwave ultraviolet radiation, or electron radiation.

Career Highlights

The patent focuses on improving the suitability of ultraviolet-curing inks for printing on plastic bases that are difficult to adhere to. Its described applications include printing characters, figures, and patterns on those surfaces.

Collaborations

Murooka’s listed coworkers include Yosuke Hitomi and Fuminori Tokuda. The patent is associated with TDK Corporation.

Conclusion

Mari Murooka’s patent work at TDK Corporation centers on an ultraviolet-curing ink and printing process designed for slightly adherent plastic surfaces.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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