Margaret E Best

Title: The Innovative Contributions of Margaret E Best

Introduction

Margaret E Best is a prominent inventor based in San Jose, CA, known for her significant contributions to the field of nanoimprint lithography. With a total of 14 patents to her name, she has made remarkable advancements in materials and processes that enhance the efficiency and effectiveness of manufacturing techniques.

Latest Patents

Among her latest patents is a groundbreaking invention titled "Self-releasing resist material for nano-imprint processes." This patent describes a method of using a non-ionic surfactant in resist materials to improve the release of templates during the nanoimprint lithography process. The resist material, which may include hydrocarbon materials with unsaturated bonds, is enhanced by the addition of surfactants such as polyalkylene glycol or organically modified polysiloxane. This innovation allows for the formation of a resist release layer, facilitating the pressing of templates into the resist layer.

Another notable patent is the "Method and apparatus for separating a stamper from a patterned substrate." This invention outlines a method for effectively separating a stamper from a substrate by utilizing pressurized air directed into a chamber formed within the substrate. This technique is particularly useful in the production of patterned magnetic media for storage devices.

Career Highlights

Throughout her career, Margaret has worked with leading companies in the technology sector, including IBM and Hitachi Global Storage Technologies Netherlands B.V. Her experience in these organizations has allowed her to develop and refine her innovative ideas, contributing to advancements in storage technology and manufacturing processes.

Collaborations

Margaret has collaborated with notable professionals in her field, including Kurt A Rubin and Hal Jervis Rosen. These partnerships have fostered a creative environment that has led to the development of her influential patents.

Conclusion

Margaret E Best's contributions to the field of nanoimprint lithography and her innovative patents have significantly impacted the technology landscape. Her work continues to inspire future advancements in manufacturing processes and materials science.