Margaret C. Plain is a notable inventor based in Rochester, NY (US). She has made significant contributions to the field of engineering, particularly in the development of innovative systems for reproduction apparatuses. With a total of 6 patents to her name, her work has had a substantial impact on the industry.

Latest Patents

One of her latest patents is the "Self-aligning, low jam rate idler assembly." This idler system is designed to be both self-centering and self-aligning with a drive roll. The assembly consists of a pair of rolls connected by a shaft, which is supported in a housing. The housing is retained by a resilient spring member, allowing the axis of rotation of the idler rolls to pivot in multiple planes simultaneously. This pivoting aligns the axis of rotation of the idler assembly parallel to the drive roll axis, preventing skewing of sheets as they are driven through the nip formed by the drive roll and the idler roll. The resilient spring mounting also facilitates easy replaceability of the idler assembly, enhancing the overall efficiency of the system.

Another significant patent is the "Sheet stacking and reversing separator." This invention is part of a sheet output system with a stacking tray for a reproduction apparatus. It features a sheet separating assistance unit mounted adjacent to the ejection nip, equipped with three evenly spaced radially extending sheet separating arms. One of these arms automatically extends into the output path, engaging with the moving sheet's lead edge to provide sheet separating assistance, even during duplexing operations. The device's automatic realignment to a lead edge catching position is facilitated by gravity, ensuring smooth operation.

Career Highlights

Margaret C. Plain has had a distinguished career at Xerox Corporation, where she has been instrumental in developing innovative technologies. Her work has not only advanced the capabilities of reproduction apparatuses but has also contributed to the efficiency and reliability of these systems.

Collaborations

Throughout her career, Margaret has collaborated with several talented individuals, including Robert F. Rubscha and John D. Gramlich. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Margaret C. Plain's contributions to the field of engineering and her innovative patents have made a lasting impact on the industry. Her work continues to inspire

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