Company Filing History:
Years Active: 2017
Title: The Innovations of Marcus Wislicenus
Introduction
Marcus Wislicenus is a notable inventor based in Munich, Germany. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique semiconductor structure that enhances the efficiency of electronic devices.
Latest Patents
Wislicenus holds a patent for a semiconductor structure that includes a layer of a first metal positioned between a diffusion barrier layer and a second metal. The patent describes a method for forming this structure, which involves providing a semiconductor structure with a recess that may contain a contact via or a trench. A layer of the first metal is deposited over the semiconductor structure, followed by an electroless deposition process that removes a portion of this layer while depositing a first layer of a second metal. An electroplating process is then performed to deposit a second layer of the second metal over the first layer, leaving a portion of the first metal intact within the semiconductor structure.
Career Highlights
Wislicenus is currently employed at Globalfoundries Inc., a leading company in semiconductor manufacturing. His work focuses on advancing semiconductor technologies that are crucial for modern electronics. His innovative methods have the potential to improve the performance and reliability of various electronic components.
Collaborations
Throughout his career, Wislicenus has collaborated with talented professionals in the field, including Axel Preusse and Romy Liske. These collaborations have fostered an environment of innovation and creativity, leading to advancements in semiconductor technology.
Conclusion
Marcus Wislicenus is a prominent figure in the semiconductor industry, with a patent that showcases his innovative methods for enhancing semiconductor structures. His contributions continue to influence the development of efficient electronic devices.