Marcus Schaffrath

Title: The Innovations of Marcus Schaffrath

Introduction

Marcus Schaffrath is an accomplished inventor based in Alsdorf, Germany. He has made significant contributions to the field of chemical vapor deposition (CVD) technology. His innovative designs have the potential to enhance the efficiency and effectiveness of CVD reactors.

Latest Patents

One of Marcus Schaffrath's notable patents is for a susceptor for a CVD reactor. This invention features a flat circular disc-shaped body with channels arranged on a broad side of the disc. These channels extend within one or more circular surface sections to effectively transfer heat to a substrate holder. The channels are designed to run in a spiral manner around the centers of the circular surface sections and are formed as depressions that open towards the plane. Each channel has an opening that is fluidically connected to a feed opening at the end of a gas supply line. Additionally, the surface sections are equipped with influencing elements that modify local heat transfer, which can be formed as open depressions or as insert pieces that fit into the depressions.

Career Highlights

Marcus Schaffrath is currently employed at Aixtron SE, a company known for its advanced deposition equipment for the semiconductor industry. His work at Aixtron SE has allowed him to focus on developing innovative solutions that improve CVD processes.

Collaborations

Throughout his career, Marcus has collaborated with talented individuals such as Oliver Schön and Francisco Ruda Y Witt. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Marcus Schaffrath's contributions to the field of CVD technology exemplify the spirit of innovation. His patent for a susceptor demonstrates his commitment to enhancing industrial processes. His work continues to influence advancements in the semiconductor industry.