This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Huttlin Gmbh. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Innovations by Marcus Knöll in Filter Technology
Introduction
Marcus Knöll is an accomplished inventor based in Lörrach, Germany. He has made significant contributions to the field of filter technology, particularly in the cleaning of process gases contaminated with particles. His innovative approach has led to the development of a unique filter arrangement that enhances efficiency and effectiveness in cleaning processes.
Latest Patents
Marcus Knöll holds a patent for a "Filter arrangement for cleaning process gases contaminated with particles and process for cleaning filter units of such a filter arrangement." This invention features a filter unit with both exterior and interior filters that can move relative to each other. This design allows for the cleaning of filter units on-site without the need for disassembly, a process known as cleaning in place (CIP). The method involves introducing a fluid through a cleaning lance into the clean gas region while exposing a gap in the bottom region of the filters.
Career Highlights
Marcus Knöll is currently employed at Huttlin GmbH, where he continues to innovate in the field of filtration technology. His work has been instrumental in advancing methods for cleaning filter units, thereby improving operational efficiency in various industrial applications.
Collaborations
Throughout his career, Marcus has collaborated with notable colleagues, including Martin Gross and Uwe Schmidt. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Marcus Knöll's contributions to filter technology exemplify the impact of innovative thinking in solving complex industrial challenges. His patent and ongoing work at Huttlin GmbH highlight the importance of advancements in filtration processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile