Round Rock, TX, United States of America

Marcus J Carey

This inventor holds 7 USPTO granted patents and 2 published patent applications. Top assignees: Reliaquest Holdings, LLC, Vthreat, Inc., Other. Active years: 2007-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marcus J Carey. Retrieved from https://idiyas.com/inventor/marcus-j-carey

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 

% Patents Active = 100.0

Average Co-Inventor Count = 2.1

ph-index = 3

Forward Citations = 41(Granted Patents)


Location History:

  • Sparta, KY (US) (2007)
  • Round Rock, TX (US) (2019 - 2021)
  • Austin, TX (US) (2023)

Company Filing History:


Years Active: 2007-2026

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7 patents (USPTO):Explore Patents

Title: The Innovative Journey of Marcus J Carey

Introduction: Marcus J Carey, a talented inventor hailing from Round Rock, TX, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Marcus J Carey's latest patents showcase his ingenuity in the field of cybersecurity, with a focus on developing advanced solutions to combat emerging threats in the digital landscape.

Career Highlights: With a career spanning over two decades, Marcus J Carey has established himself as a prominent figure in the tech industry. His work has been instrumental in shaping the way we approach cybersecurity and data protection.

Collaborations: Throughout his career, Marcus J Carey has collaborated with leading tech companies and research institutions to further his innovative projects. His ability to work effectively in teams has led to the successful development of cutting-edge technologies.

Conclusion: Marcus J Carey's passion for innovation and his dedication to pushing the boundaries of technology continue to inspire the next generation of inventors. His impact on the field of cybersecurity is truly remarkable, and his legacy will undoubtedly endure for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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