This inventor holds 3 USPTO granted patents. Top assignee: Asml Netherlands B.v.. Active years: 2004-2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004-2007
Sure, let's proceed with writing an article about inventor Marcus E J Boonman.
Title: Spotlight on Inventor Marcus E J Boonman
Introduction:
Marcus E J Boonman is a distinguished inventor based in Veldhoven, NL, who has made significant contributions to the field of lithographic projection apparatus.
Latest Patents:
Boonman holds 3 patents, with his latest inventions focusing on off-axis leveling in lithographic projection apparatus. These patents involve generating a height map of the substrate at a measurement station, referencing it to a physical reference surface of the substrate table, and optimizing the height and tilt of the substrate table for best focus during exposure.
Career Highlights:
Currently employed at ASML Netherlands B.V., a prominent technology company in the Netherlands, Boonman has been instrumental in advancing lithographic projection technology through his innovative patents.
Collaborations:
Throughout his career, Boonman has collaborated with notable coworkers such as Theodorus Marinus Modderman and Gerrit Johannes Nijmeijer, further enhancing the impact of his inventions in the industry.
Conclusion:
Inventor Marcus E J Boonman's groundbreaking work in off-axis leveling in lithographic projection apparatus showcases his expertise and dedication to technological advancements. His patents stand as a testament to his innovative spirit and valuable contributions to the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile