Veldhoven, Netherlands

Marcus E J Boonman


Average Co-Inventor Count = 9.2

ph-index = 3

Forward Citations = 117(Granted Patents)


Company Filing History:


Years Active: 2004-2007

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3 patents (USPTO):Explore Patents

Sure, let's proceed with writing an article about inventor Marcus E J Boonman.

Title: Spotlight on Inventor Marcus E J Boonman

Introduction:

Marcus E J Boonman is a distinguished inventor based in Veldhoven, NL, who has made significant contributions to the field of lithographic projection apparatus.

Latest Patents:

Boonman holds 3 patents, with his latest inventions focusing on off-axis leveling in lithographic projection apparatus. These patents involve generating a height map of the substrate at a measurement station, referencing it to a physical reference surface of the substrate table, and optimizing the height and tilt of the substrate table for best focus during exposure.

Career Highlights:

Currently employed at ASML Netherlands B.V., a prominent technology company in the Netherlands, Boonman has been instrumental in advancing lithographic projection technology through his innovative patents.

Collaborations:

Throughout his career, Boonman has collaborated with notable coworkers such as Theodorus Marinus Modderman and Gerrit Johannes Nijmeijer, further enhancing the impact of his inventions in the industry.

Conclusion:

Inventor Marcus E J Boonman's groundbreaking work in off-axis leveling in lithographic projection apparatus showcases his expertise and dedication to technological advancements. His patents stand as a testament to his innovative spirit and valuable contributions to the field.

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