Meschede, Germany

Marco Rasel

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Infineon Technologies Ag. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marco Rasel. Retrieved from https://idiyas.com/inventor/marco-rasel-1jsgvq75

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Marco Rasel: Innovator in Base Plate Production

Introduction

Marco Rasel is a notable inventor based in Meschede, Germany. He has made significant contributions to the field of materials engineering, particularly in the production of base plates. His innovative methods have the potential to enhance manufacturing processes in various industries.

Latest Patents

Marco Rasel holds a patent for a method of producing a base plate. This method involves forming a layer of metallic material and creating at least one first area within that layer. The process includes locally deforming the metallic layer or inducing stress, resulting in a deflection or local stress that differs from the surrounding areas. This innovative approach can lead to improved performance and durability of base plates.

Career Highlights

Marco Rasel is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to apply his inventive skills in a practical setting, contributing to advancements in technology and manufacturing.

Collaborations

Marco collaborates with his coworker, Elvis Keli, to further enhance their projects and drive innovation within their team.

Conclusion

Marco Rasel's contributions to the field of base plate production exemplify the impact of innovative thinking in engineering. His patent and work at Infineon Technologies AG highlight the importance of creativity in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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