Porto Alegre, Brazil

Marcio Riveiro

This inventor holds 1 USPTO granted patent. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marcio Riveiro. Retrieved from https://idiyas.com/inventor/marcio-riveiro

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Marcio Riveiro: Innovator in Printing Device Technology

Introduction

Marcio Riveiro is a notable inventor based in Porto Alegre, Brazil. He has made significant contributions to the field of printing technology, particularly through his innovative patent related to proximity beacon identifications.

Latest Patents

Riveiro holds a patent for a printing device proximity beacon identification system. This invention involves a method for connection identification that includes determining the proximity of a user device to a printing device. The system compares beacons received from both devices to confirm their connection, enhancing the user experience in printing tasks.

Career Highlights

Marcio Riveiro is currently employed at Hewlett-Packard Development Company, L.P. His work focuses on advancing printing technologies and improving connectivity solutions for users. With a patent portfolio that includes 1 patent, Riveiro continues to push the boundaries of innovation in his field.

Collaborations

One of Riveiro's notable coworkers is Carlos Leao. Together, they contribute to the development of cutting-edge technologies at Hewlett-Packard.

Conclusion

Marcio Riveiro's contributions to printing technology exemplify the spirit of innovation. His work not only enhances user connectivity but also sets a foundation for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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