Rybnik, Poland

Marcin Banaszynski

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Oura Health Oy. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marcin Banaszynski. Retrieved from https://idiyas.com/inventor/marcin-banaszynski

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Marcin Banaszynski: Wearable Data and Experimental Programs

Introduction

Marcin Banaszynski is an inventor based in Rybnik, Poland. His patent work includes a method for using data from wearable devices to support experimental programs focused on behavioral changes.

Latest Patents

Banaszynski is associated with 1 patent, titled “Techniques for Experimental Programs Using Data from Wearable Device.” The invention describes acquiring baseline photoplethysmography (PPG) data from a user through a wearable device and using that data to present relevant experimental programs on a user device. Each program is associated with one or more behavioral changes. After the user selects a program, the system collects additional PPG data during the program and uses that data, along with information received through the user device, to assess adherence. It then displays changes between the baseline and additional data in relation to the user’s adherence.

Career Highlights

Banaszynski works at Oura Health Oy, a company focused on wearable health technology. His patent describes how wearable measurements can be incorporated into personalized programs and used to track behavioral changes over time.

Collaborations

His listed coworkers include Laura Furman and Quynh Nguyen.

Conclusion

Marcin Banaszynski’s patent connects wearable PPG data with personalized behavioral experiments, illustrating an approach to monitoring adherence and presenting changes to users.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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