West Hills, CA, United States of America

Marcelo Noroña

This inventor holds 1 USPTO granted patent. Top assignees: Lawrence Livermore National Security, LLC, Lockwood Industries, Inc.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marcelo Noroña. Retrieved from https://idiyas.com/inventor/marcelo-noroña

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

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Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Marcelo Noroña: High-Gradient Insulator Fabrication

Introduction

Marcelo Noroña is an inventor based in West Hills, California. His work includes a patented method for fabricating high-gradient insulators, components used in high-voltage vacuum applications.

Latest Patents

Noroña is associated with 1 patent, titled “Fabrication of High Gradient Insulators by Stack Compression.” The method begins with individual insulator layers pre-cut to their final dimensions. The layers are stacked and aligned with a sacrificial alignment tube, then hot-pressed into an insulator unit of the desired dimensions. The tube is removed after pressing. These insulators can be used in energy storage and transmission structures, including particle accelerators and pulsed-power systems.

Career Highlights

Noroña’s listed professional affiliations include Lockwood Industries, Inc. and Lawrence Livermore National Security, LLC. His patented work addresses the fabrication of high-gradient insulators for demanding electrical and vacuum environments.

Collaborations

Noroña’s listed coworkers include John Richardson Harris and Dave Sanders.

Conclusion

Marcelo Noroña’s patent describes a layer-stacking and compression process for producing high-gradient insulators, connecting his inventive work with applications in particle accelerators, pulsed-power systems, and other energy technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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