Luebeck, Germany

Marcel Overberg

This inventor holds 1 USPTO granted patent and 2 published patent applications and 2 EPO patents. Top assignee: Nikon Slm Solutions Ag. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marcel Overberg. Retrieved from https://idiyas.com/inventor/marcel-overberg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Marcel Overberg - Innovator in Additive Manufacturing

Introduction

Marcel Overberg is an inventor based in Lübeck, Germany. He is currently associated with Nikon SLM Solutions AG, where he contributes to advancements in additive manufacturing technologies. Although he does not hold any granted patents, his work in the field is noteworthy.

Latest Patent Applications

Marcel Overberg has submitted a patent application for a "Powder Container for an Additive Manufacturing Process." This innovative container is designed for handling powder in additive manufacturing. It features a powder vessel with a powder inlet in the upper portion and a powder outlet in the lower portion. The design includes a set of sensors to determine various observables, a first actuator to drive a mechanical function, and an optional second actuator for added safety and versatility. Additionally, it incorporates a multi-port connector for connection with a powder handling station.

Conclusion

Marcel Overberg's contributions to the field of additive manufacturing, particularly through his latest patent application, highlight his innovative approach to improving powder handling processes. His work at Nikon SLM Solutions AG positions him as a significant figure in the ongoing evolution of manufacturing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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