Paris, France

Marc Werly

This inventor holds 3 USPTO granted patents. Top assignees: Ellena, Other. Active years: 1988-1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marc Werly. Retrieved from https://idiyas.com/inventor/marc-werly

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.6

ph-index = 3

Forward Citations = 92(Granted Patents)


Location History:

  • 75014 Paris, FR (1988)
  • Paris, FR (1991 - 1993)

Company Filing History:


Years Active: 1988-1993

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Marc Werly

Introduction

Marc Werly is a notable inventor based in Paris, France. He has made significant contributions to the field of dentistry through his innovative patents. With a total of 3 patents, Werly has focused on enhancing dental procedures and tools.

Latest Patents

Werly's latest patents include a dentistry set that features a head inclined with respect to the drill axis. This design aims to improve the efficiency and effectiveness of dental procedures. Another significant patent is a differential photopolymerization process used for filling dental cavities. This invention relates to a process for filling a cavity within a tooth or mold, utilizing a photosensitive resin that is solidified through photopolymerization.

Career Highlights

Throughout his career, Marc Werly has worked with various companies, including Ellena. His work has been instrumental in advancing dental technology and improving patient care.

Collaborations

Werly has collaborated with notable individuals in the field, including Victor Ringeisen and Paul Bleicher. These partnerships have contributed to the development of innovative dental solutions.

Conclusion

Marc Werly's contributions to dental innovation through his patents and collaborations highlight his commitment to improving dental practices. His work continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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