This inventor holds 1 USPTO granted patent. Top assignee: Luchaire S.a.. Active years: 1989.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1989
Title: Marc Reuche: Innovator in Ammunition Technology
Introduction
Marc Reuche is a notable inventor based in Bourges, France. He has made significant contributions to the field of ammunition technology, particularly with his innovative designs aimed at improving projectile performance. His work focuses on reducing drag in ammunition, which can enhance the range and effectiveness of projectiles.
Latest Patents
Marc Reuche holds a patent for a "Device for reducing ammunition drag and ammunition for receiving said." This device incorporates a gas-producing compound that generates gases to fill the low-pressure region formed at the rear end of a projectile, thereby reducing drag. The design includes a gas-tight casing that contains the explosive compound and an igniter for initiating combustion. This innovative approach allows for a gas-tight fitting at the rear end of the projectile, which can be applied at any moment, particularly at the firing location.
Career Highlights
Throughout his career, Marc has demonstrated a commitment to advancing ammunition technology. His patent reflects a deep understanding of the mechanics involved in projectile motion and the factors that influence performance. His work has the potential to significantly impact military and defense applications.
Collaborations
Marc Reuche collaborates with Michel Schilling, a fellow innovator in the field. Their partnership has likely contributed to the development and refinement of their technologies, enhancing the effectiveness of their inventions.
Conclusion
Marc Reuche's contributions to ammunition technology exemplify the importance of innovation in enhancing performance and efficiency. His patented device represents a significant advancement in the field, showcasing his expertise and dedication to improving projectile technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile