This inventor holds 8 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 1994-2001.
Company Filing History:
Years Active: 1994-2001
Title: Manus K Wong: Innovator in HDP-CVD Technology
Introduction
Manus K Wong is a prominent inventor based in San Jose, CA, known for his significant contributions to the field of high-density plasma chemical vapor deposition (HDP-CVD) technology. With a total of 8 patents to his name, Wong has made remarkable advancements that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Wong's latest patents include innovative tools designed for HDP-CVD applications. One of his notable inventions is the "Symmetric Tunable Inductively Coupled HDP-CVD Reactor." This invention provides a tool capable of simultaneous deposition and sputtering of doped and undoped silicon dioxide. It excels in gap fill and blanket film deposition on wafers with sub 0.5 micron feature sizes and aspect ratios higher than 1.2:1. The system features a dual RF zone inductively coupled plasma source configuration, a dual zone gas distribution system, temperature-controlled surfaces, and a symmetrically shaped turbomolecular pumped chamber body, among other advanced components.
Another significant patent is the "Multi-Zone RF Inductively Coupled Source Configuration." This tool also focuses on simultaneous deposition and sputtering of silicon dioxide, incorporating a dual RF zone inductively coupled plasma source, a dual zone gas distribution system, and a remote plasma chamber cleaning system to ensure high efficiency and uniformity in film deposition.
Career Highlights
Manus K Wong is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has positioned him as a key player in the development of cutting-edge technologies that drive innovation in semiconductor manufacturing.
Collaborations
Throughout his career, Wong has collaborated with notable colleagues, including Sandy M Chew and Fred Conrad Redeker. These collaborations have contributed to the advancement of HDP-CVD technology and have fostered a culture of innovation within the industry.
Conclusion
Manus K Wong's contributions to HDP-CVD technology through his patents and work at Applied Materials, Inc. highlight his role as a significant innovator in the semiconductor field. His inventions continue to influence the efficiency and effectiveness of semiconductor manufacturing processes.