This inventor holds 1 USPTO granted patent. Top assignee: Boston University. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Manuel Toledo-Quinones: Inventor in Chemical Vapor Deposition
Introduction
Manuel Toledo-Quinones is an inventor associated with Boston University in Boston, Massachusetts. His work includes a patented method for controlling chemical vapor deposition through closed-loop monitoring of growth rate.
Latest Patents
The available information identifies one patent associated with Toledo-Quinones: “Method for Closed Loop Control of Chemical Vapor Deposition Process.” The invention controls the application of a surface coating by comparing the measured growth rate with a target setpoint. It then adjusts a primary input parameter to bring the measured rate toward, or maintain it at, that setpoint. This closed-loop approach is designed to regulate the coating process based on growth-rate feedback.
Career Highlights
Toledo-Quinones is associated with Boston University, where his work connects to process control and surface-coating technology. His patent describes a feedback-based method for managing chemical vapor deposition.
Collaborations
Michael Alan Gevelber is identified as a coworker. The information provided does not specify the nature of their collaboration.
Conclusion
Manuel Toledo-Quinones’s identified patent applies closed-loop growth-rate control to chemical vapor deposition, highlighting a practical approach to regulating surface-coating processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile