Munich, Germany

Manuel Möhrle

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignee: Sick Ag. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Manuel Möhrle. Retrieved from https://idiyas.com/inventor/manuel-mohrle

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Manuel Möhrle: Innovator in Optical Detection Technology

Introduction

Manuel Möhrle is a notable inventor based in Munich, Germany. He has made significant contributions to the field of optical detection technology. His innovative approach has led to the development of a unique method for estimating contamination levels in optical detection apparatuses.

Latest Patents

Möhrle holds a patent for a method of estimating a degree of contamination of a front screen of an optical detection apparatus. This patent outlines a process that includes transmitting multiple radiation pulses into a detection zone and generating reception signals for each pulse. The method involves averaging these signals to determine contamination values based on amplitude and peak shape evaluations.

Career Highlights

Manuel Möhrle is currently employed at Sick AG, a company known for its advancements in sensor technology. His work at Sick AG has allowed him to focus on developing innovative solutions that enhance the performance of optical detection systems.

Collaborations

Möhrle collaborates with Christian Hulm, a fellow innovator in the field. Their partnership has fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Manuel Möhrle's contributions to optical detection technology exemplify the impact of innovation in enhancing industrial applications. His patent and ongoing work at Sick AG highlight his commitment to advancing this important field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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