Company Filing History:
Years Active: 2025
Title: Manuel Alejandro Fernandez Lopez: Innovator in EUV Photolithography
Introduction
Manuel Alejandro Fernandez Lopez is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photolithography, particularly in the area of extreme ultraviolet (EUV) exposure techniques. His innovative work has led to advancements that are crucial for the semiconductor manufacturing industry.
Latest Patents
Fernandez Lopez holds a patent titled "Method and system to introduce bright field imaging at stitching area of high-NA EUV exposure." This patent describes a double exposure EUV photolithography process that utilizes a first bright field reticle and a second bright field reticle. The exposure areas of these reticles overlap, enhancing the imaging capabilities in high-NA EUV applications. Each reticle includes a substrate, a reflective multilayer, a main pattern of absorption material, a black border area, and an additional absorption area situated between the black border and the main pattern. This innovative approach is essential for improving the precision and efficiency of photolithography processes.
Career Highlights
Fernandez Lopez is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at TSMC has positioned him at the forefront of technological advancements in chip manufacturing. His expertise in EUV technology is instrumental in developing next-generation semiconductor devices.
Collaborations
Throughout his career, Fernandez Lopez has collaborated with esteemed colleagues such as Sheng-Min Wang and Ken-Hsien Hsieh. These collaborations have fostered a productive environment for innovation and have contributed to the success of various projects within the company.
Conclusion
Manuel Alejandro Fernandez Lopez is a key figure in the field of EUV photolithography, with a focus on enhancing imaging techniques for semiconductor manufacturing. His contributions, particularly through his patent, reflect his commitment to advancing technology in this critical industry.