Somerset{grave over ( )}, NJ, United States of America

Manish Khandelwal


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):

Title: Manish Khandelwal: Innovator in Si-Containing Film Forming Precursors

Introduction

Manish Khandelwal is a notable inventor based in Somerset, NJ (US). He has made significant contributions to the field of chemical engineering, particularly in the development of innovative materials. His work focuses on the production of halosilazane, which has various applications in the semiconductor industry.

Latest Patents

Khandelwal holds a patent for "Si-containing film forming precursors and methods of using the same." This patent describes methods for producing halosilazane by halogenating a hydrosilazane with a halogenating agent. The resulting halosilazane has a specific chemical formula that allows for versatile applications in material science.

Career Highlights

Manish Khandelwal is currently employed at L'air Liquide Société Anonyme Pour L'étude Et L'exploitation Des Procédés Georges Claude. His role involves research and development in advanced materials, contributing to the company's innovative projects.

Collaborations

Khandelwal has worked alongside esteemed colleagues such as Jean-Marc Girard and Peng Zhang. Their collaborative efforts have furthered advancements in the field of chemical engineering and materials science.

Conclusion

Manish Khandelwal's contributions to the development of Si-containing film forming precursors highlight his innovative spirit and dedication to advancing technology. His work continues to impact the industry positively.

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