Company Filing History:
Years Active: 2000-2006
Title: The Innovative Contributions of Mandar Mudholkar
Introduction
Mandar Mudholkar is a prominent inventor based in Fremont, CA, known for his significant contributions to the field of substrate processing systems. With a total of six patents to his name, his work has paved the way for advancements in the monitoring and adjustment of chamber impedance and mixed frequency chemical vapor deposition (CVD) processes.
Latest Patents
Among his latest innovations, Mudholkar has developed a "Method and apparatus for monitoring and adjusting chamber impedance." This patent describes a substrate processing system featuring a deposition chamber with a reaction zone, wherein a gas distribution system supplies process gases. The innovation includes an impedance monitor, which measures plasma impedance levels, thus enabling a computer processor to adjust chamber impedance during extended wafer runs if any deviations occur.
Another of his notable patents is the "Mixed frequency CVD process." This invention entails a substrate processing system equipped with a ceramic substrate holder that contains an embedded RF electrode. This system also includes a gas inlet manifold acting as the second RF electrode. The conical holes incorporated into the inlet allow for optimal gas flow to the reaction zone, enhancing the deposition of films, including silicon nitride, with previously unattainable characteristics.
Career Highlights
Mandar Mudholkar is currently employed at Applied Materials, Inc., a leading company in the field of semiconductor manufacturing equipment. His work at Applied Materials has further established him as a key figure in innovations surrounding deposition technologies, contributing to advancements that benefit the semiconductor industry.
Collaborations
Throughout his career, Mudholkar has collaborated closely with fellow experts such as Sebastien Raoux and William N Taylor. These partnerships underscore the importance of teamwork in driving innovation within cutting-edge technologies.
Conclusion
In conclusion, Mandar Mudholkar's inventive spirit and technical prowess have led to the development of groundbreaking technologies in substrate processing systems. With multiple patents that enhance the efficiencies and effectiveness of semiconductor manufacturing, Mudholkar continues to shape the future of innovation in his field.