Manbok Kim

Title: Manbok Kim - Innovator in Semiconductor Technology

Introduction

Manbok Kim is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor devices, holding a total of 2 patents. His work is recognized for its innovative approaches to enhancing semiconductor technology.

Latest Patents

Manbok Kim's latest patents focus on advanced semiconductor devices. These devices may include an active pattern, a gate structure positioned in the upper portion of the active pattern, and a bit line structure situated on the active pattern. Additionally, they feature a lower spacer structure on the lower portion of a sidewall of the bit line structure, along with an upper spacer structure on the upper portion of the sidewall. The lower spacer structure consists of first and second lower spacers that are sequentially stacked. The first lower spacer contacts the lower portion of the sidewall of the bit line structure and does not contain nitrogen, while the second lower spacer is made from a different material. Furthermore, a portion of the upper spacer structure that contacts the upper portion of the sidewall of the bit line structure also includes a material distinct from that of the first lower spacer.

Career Highlights

Manbok Kim is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing innovative solutions that enhance the performance and efficiency of semiconductor devices.

Collaborations

Manbok Kim collaborates with talented colleagues, including Hyosub Kim and Keunnam Kim. Their combined expertise contributes to the advancement of semiconductor technologies within their organization.

Conclusion

Manbok Kim is a notable inventor whose work in semiconductor devices has led to significant advancements in the field. His contributions at Samsung Electronics Co., Ltd. and his innovative patents reflect his commitment to technological progress.