Manas Ranjan Gartia

Urbana, IL, United States of America

Manas Ranjan Gartia

USPTO Granted Patents = 7 

Average Co-Inventor Count = 3.1

ph-index = 1

Forward Citations = 6(Granted Patents)


Location History:

  • Urbana, IL (US) (2016 - 2019)
  • Baton Rouge, LA (US) (2019 - 2023)

Company Filing History:


Years Active: 2016-2023

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7 patents (USPTO):Explore Patents

Introduction

Manas Ranjan Gartia is a prominent inventor based in Urbana, IL, known for his significant contributions to the field of graphene technology. With a total of seven patents to his name, Gartia's work focuses on innovative methods of fabricating graphene structures, which have vast applications in electronics and energy storage.

Latest Patents

Among his latest innovations is a groundbreaking patent entitled "Multilayered graphene and methods of making the same." This invention details a method for fabricating graphene structures from graphene oxide by reducing it on a patterned substrate. The implications of this work extend to the development of high-performance electrodes and capacitors utilizing these graphene structures, marking a significant advancement in material science.

Career Highlights

Manas Ranjan Gartia has had an illustrious career that includes notable positions at the University of Illinois and the Board of Supervisors of Louisiana State University and Agricultural and Mechanical College. His work at these prestigious institutions has established him as a leader in his field, contributing to cutting-edge research in nanotechnology and materials engineering.

Collaborations

Throughout his career, Gartia has collaborated with talented individuals such as Gang Logan Liu and Ardalan Chaichi. These partnerships have facilitated the exchange of ideas and fostered innovation, further enhancing the impact of his research and inventions.

Conclusion

In summary, Manas Ranjan Gartia's contributions to graphene technology underscore his role as a key inventor in the industry. His innovative patents and collaborative efforts with esteemed colleagues reflect his dedication to advancing technological frontiers and highlight his significant impact on modern materials science.

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