Shunan, Japan

Manabu Sakida

This inventor holds 3 USPTO granted patents and 4 published patent applications and 3 EPO patents. Top assignee: Tokuyama Corporation. Active years: 2010-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Manabu Sakida. Retrieved from https://idiyas.com/inventor/manabu-sakida

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 33.3

 

Average Co-Inventor Count = 1.5

ph-index = 1


Company Filing History:


Years Active: 2010-2025

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3 patents (USPTO):Explore Patents

Title: Manabu Sakida - Innovator in Polycrystalline Silicon Production

Introduction

Manabu Sakida is an inventor based in Shunan-shi, Japan. He has made significant contributions to the field of silicon production, particularly through his innovative methods for producing polycrystalline silicon. His work focuses on improving the efficiency and sustainability of silicon production processes.

Latest Patent Applications

Manabu Sakida has filed a patent application titled "METHOD FOR PRODUCING POLYCRYSTALLINE SILICON." This application outlines a process for producing polycrystalline silicon, which includes several key steps. The process involves a silicon deposition step that produces silicon through a reaction between a chlorosilane compound and hydrogen. Following this, a conversion reaction step removes hydrogen chloride from the exhaust gas by contacting it with activated carbon. A separation step is then employed to extract hydrogen from the gas after the conversion reaction. Finally, a recycling step supplies the extracted hydrogen back to the silicon deposition step. The application specifies that at least one of two conditions must be satisfied to enhance the process's efficiency.

Conclusion

Manabu Sakida's innovative approach to polycrystalline silicon production showcases his commitment to advancing technology in this field. His patent application reflects a thoughtful consideration of both efficiency and environmental impact.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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