Manabu Gotoh

Title: Manabu Gotoh: Innovator in Exposure Technology

Introduction

Manabu Gotoh is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of exposure technology, particularly in the fabrication of high-density circuit films and semiconductor processing. With a total of 2 patents, his work has had a notable impact on the electronics industry.

Latest Patents

Gotoh's latest patents include an innovative exposure apparatus and a method for exposing the peripheral part of a wafer. The exposure apparatus allows for the projection of a mask image onto a band-shaped film with high precision in position, magnification, and focus. This technology is essential for the fabrication of flexible printed circuit (FPC) films with high circuit density. His method for exposing the peripheral part of a wafer enhances the fine pattern formation process in integrated circuits (ICs) and large-scale integrations (LSIs). By detecting the wafer edge with a sensor, the method ensures accurate exposure while eliminating the need for traditional centering mechanisms, thus significantly reducing processing time and improving efficiency.

Career Highlights

Manabu Gotoh is currently employed at Ushio Denki, where he continues to develop cutting-edge technologies in the field of exposure systems. His expertise and innovative approach have positioned him as a key figure in advancing exposure technology.

Collaborations

Throughout his career, Gotoh has collaborated with notable colleagues such as Shigeru Suzuki and Kazuya Tanaka. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Manabu Gotoh's contributions to exposure technology exemplify the spirit of innovation in the electronics industry. His patents reflect a commitment to enhancing the efficiency and accuracy of semiconductor processing. His work continues to influence the development of advanced technologies in this critical field.