Location History:
- Kanagawa, JP (2021 - 2023)
- Yokohama Kanagawa, JP (2021 - 2023)
Company Filing History:
Years Active: 2021-2023
Title: Mana Tanabe - Innovator in Substrate Treatment Technology
Introduction
Mana Tanabe is an inventive mind based in Tokyo, Japan. She has made significant strides in the field of substrate treatment technology. Her innovative approach focuses on improving methods for treating substrates, which is crucial in various industrial applications.
Latest Patent Applications
Mana Tanabe's notable patent application is titled "SUBSTRATE TREATMENT APPARATUS AND METHOD FOR TREATING SUBSTRATE." This application describes a substrate treatment apparatus that incorporates a contaminant adhered to a substrate surface by freezing a liquid film on the surface. The apparatus features a placement part designed to rotate the substrate, a liquid supply part that delivers liquid via a nozzle to the frozen film containing the contaminant, a moving part that allows the nozzle to move parallel to the substrate surface, and a controller that manages the rotation of the substrate, the liquid supply, and the nozzle movement. The controller effectively coordinates these components to enhance the substrate treatment process.
Conclusion
Mana Tanabe's contributions to substrate treatment technology reflect her innovative spirit and dedication to advancing industrial processes. Her work has the potential to influence various applications in the field.