Mamoru Tashiro

Title: Mamoru Tashiro: Innovator in Chemical Vapor Deposition Technology

Introduction

Mamoru Tashiro is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of 9 patents to his name, Tashiro continues to push the boundaries of innovation in semiconductor manufacturing.

Latest Patents

Tashiro's latest patents include a groundbreaking microwave enhanced CVD method and apparatus. This innovative chemical vapor reaction system introduces a mixed cyclotron resonance as the main exciting principle for chemical vapor reactions. Unlike traditional electron cyclotron resonance (ECR), where electrons move independently, this new resonance allows for a larger resonating space. This advancement enables the deposition of high melting point materials, such as diamond, in the form of thin films. Additionally, he has developed a CVD apparatus that features a reaction chamber with a pair of electrodes defining a plasma generating space. A metallic enclosure surrounds this space, preventing the produced plasma from escaping and allowing for the support of one or more substrates to be coated.

Career Highlights

Tashiro has established himself as a key figure in the semiconductor industry. His work at Semiconductor Energy Laboratory Co., Ltd. has been instrumental in advancing CVD technologies. His innovative approaches have garnered attention and respect within the scientific community.

Collaborations

Throughout his career, Tashiro has collaborated with notable figures in the field, including Shunpei Yamazaki and Kazuo Urata. These partnerships have further enriched his research and development efforts.

Conclusion

Mamoru Tashiro's contributions to chemical vapor deposition technology have positioned him as a leading inventor in the semiconductor industry. His innovative patents and collaborative efforts continue to influence advancements in material science and manufacturing processes.