The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2004
Filed:
Jun. 06, 1995
Applicant:
Inventors:
Takashi Inujima, Atsugi, JP;
Naoki Hirose, Atsugi, JP;
Mamoru Tashiro, Tokyo, JP;
Shunpei Yamazaki, Tokyo, JP;
Assignee:
Semiconductor Energy Laboratory Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/46 ; H05H 1/18 ; C23C 1/626 ; C23C 1/634 ; C23C 1/640 ;
U.S. Cl.
CPC ...
H05H 1/46 ; H05H 1/18 ; C23C 1/626 ; C23C 1/634 ; C23C 1/640 ;
Abstract
A new chemical vapor reaction system is described. Instead of ECR where electrons can move as independent particles without interaction, a mixed cyclotron resonance is a main exciting principal for chemical vapor reaction. In the new proposed resonance, the resonating space is comparatively large so that a material having a high melting point such as diamond can be deposited in the form of a thin film by this inovative method.