Tokyo, Japan

Mamoru Mori

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Ihi Aerospace Co., Ltd., Seiren Company, Ltd. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mamoru Mori. Retrieved from https://idiyas.com/inventor/mamoru-mori-h3yvzq7a

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Mamoru Mori: Innovator in Corner Reflector Technology

Introduction

Mamoru Mori is a distinguished inventor based in Tokyo, Japan. He is known for his innovative contributions to the field of reflective technology, particularly through his unique patent involving corner reflectors.

Latest Patents

Mori holds a patent for a "Corner reflector and method for fabricating same." This invention features annular balloons that expand when gas is supplied, allowing for the development of radio wave reflective films. The design includes three orthogonally arranged annular balloons, each supported by a constraint fabric that enhances the functionality of the reflector.

Career Highlights

Throughout his career, Mamoru Mori has worked with notable companies such as IHI Aerospace Co., Ltd. and Seiren Company, Ltd. His experience in these organizations has contributed significantly to his expertise in the field of aerospace and reflective technologies.

Collaborations

Mori has collaborated with esteemed colleagues, including Hisanao Kataoka and Susumu Takagi. These partnerships have fostered innovation and advancement in their respective fields.

Conclusion

Mamoru Mori's contributions to corner reflector technology exemplify his innovative spirit and dedication to advancing reflective systems. His work continues to influence the industry and inspire future inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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