Tenri, Japan

Mami Tanaka

This inventor holds 1 USPTO granted patent. Top assignee: Sharp Semiconductor Innovation Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mami Tanaka. Retrieved from https://idiyas.com/inventor/mami-tanaka-pg3h9e6n

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Mami Tanaka: Optical Sensing Inventor

Introduction

Mami Tanaka is an inventor associated with Tenri, Japan, and Sharp Semiconductor Innovation Corporation. Her work includes an optical-sensing invention for estimating the distance to an object using reflected light.

Latest Patents

The provided information lists one patent for Tanaka: “Optical Sensor, Electronic Device, Distance Calculation Method, and Storage Medium of Program.” The invention describes a sensor that emits light toward an area containing an object and receives the reflected light. It generates a histogram relating the time between emission and reception to the reflected-light intensity, calculates the histogram’s skewness, and uses both the histogram and skewness to estimate the distance between the sensor and the object. Tanaka is credited with 1 patent in the supplied data.

Career Highlights

Tanaka’s listed patent reflects work on optical sensing and distance calculation. The supplied information associates her with Sharp Semiconductor Innovation Corporation.

Collaborations

Kouji Iwamori and Norikazu Okada are identified as Tanaka’s coworkers. The provided details do not specify their roles in the patent or the nature of their collaboration.

Conclusion

Mami Tanaka’s listed invention combines reflected-light timing, intensity data, and histogram skewness to support optical distance measurement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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