Greenville, SC, United States of America

Malorie Myers Burnette

This inventor holds 1 USPTO granted patent. Top assignee: Ge Infrastructure Technology, LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Malorie Myers Burnette. Retrieved from https://idiyas.com/inventor/malorie-myers-burnette

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Malorie Myers Burnette and Fluoride Ion Cleaning Systems

Introduction

Malorie Myers Burnette is an inventor associated with Greenville, South Carolina, and Ge Infrastructure Technology, LLC. Her patent work includes a fluoride ion cleaning system designed to deliver reaction gas to a component’s target area. The available information lists 1 patent.

Latest Patents

Burnette’s listed patent, “Fluoride Ion Cleaning Systems,” describes a system with a retort sized to hold at least one component. A gas distribution system supplies reaction gas through a manifold, while a flow modulator agitates the gas inside the retort. At least one nozzle, connected to the flow modulator, directs the agitated gas toward the component’s target area. This arrangement is intended to provide controlled gas flow where cleaning is needed.

Career Highlights

Burnette’s listed invention focuses on the design of gas distribution and flow control for fluoride ion cleaning. The patent identifies Ge Infrastructure Technology, LLC, as her associated company.

Collaborations

The provided information names James C. Dalton and Shan Liu as Burnette’s coworkers. Their specific roles in the patent or related work are not stated.

Conclusion

Malorie Myers Burnette’s listed patent presents a system for directing agitated reaction gas to targeted areas during fluoride ion cleaning, reflecting her documented innovation in industrial cleaning technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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